Most optical systems used in lithography include both illumination and imaging parts. The illumination part projects the light source into the plane of the objects of the optical system. In most cases, illuminators use the Kohler type of illumination, when the light source is projected to infinity. However, in some cases in illuminators, it is necessary to use the "Critical" type of illumination when the light source is projected directly into the plane of the objects of the optical system. In this case, it becomes possible to control the plane of objects, that is, to change the configuration of the object without reticle change. That is, in this case, it will be possible to change the configuration of the object without changing the reticle. In this case, the object must include a set of SLM (special light modulators) that form the desired configuration, which must be transferred to the image plane. Thus, by managing the SLM set, you can change the configuration of the object and thus exclude its replacement. That means that one reticle can be used to obtain different images. In this case, the SLM kit makes it possible to eliminate the replacement of the reticle when changing the geometric configuration of the object, which is achieved by changing the transmission (reflection) of the light flux.