Demand for High- and Hyper-NA (numerical aperture) High image quality tools including immersion systems is growing. This demand translates in necessity to design illuminator with large NA to provide all desired illumination modes. To realize sufficient image quality low levels of projection optics residual aberrations are required. Consequently, more attention should be paid to aberration correction in illuminators to ensure optimal performance of High- and Hyper-NA high quality lens system. This leads to dramatic increase of laser illumination system (LIS) optics complexity. In order to aid designs of systems providing optimal illumination conditions without degradation of LIS performance, we are presenting design methodology, based on modular configuration. In presented approach we identify three groups of modules or optical elements essential for advanced illuminator: transform lenses, relay systems, and étendue modifiers. Implementation of Köhler scheme as a transform lens system, Critical illumination as a relay lens system, and multi-aperture refractive and diffractive arrays as étendue modifiers will be discussed.